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Mr. Hua Mao
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At present, Meltblown Nonwoven Fabric is widely used in the field of air filter materials. Since the 1970s, various charging technologies and charging technologies by mixing different fibers have been developed and utilized.
As a result, there are various electrostatic column - pole processes, such as electrospinning, corona charging, friction electrification, thermal polarization, low - energy electron beam bombardment, pure water jetting, etc. Due to the different electrostatic electret processes of the materials, the properties of the formed electrets are also quite different, and there are differences in the improvement of filtration performance and the persistence of static electricity.
As we all know, with the increase of storage time, the electrostatic potential of the Melt Blown Nonwoven fabric on the surface of the electret material attenuates. It tends to be stable in a few days or so. This shows that polypropylene Meltblown Nonwoven fabric has good electrostatic properties. The greater the charging voltage, the greater the electric field strength, and the greater the electrostatic potential on the surface of the material. But it cannot exceed a certain limit. If the charging voltage exceeds 10Kv, spark discharge will occur, thus causing the material to be broken down. Therefore, the charging voltage should be chosen carefully.
At present, in terms of the properties of electrostatic electrets, the corona discharge method is a better electrostatic electret method. The thermal polarization method is also a better electrostatic electret method when the environment is relatively stable. The friction electrification method should be further improved in the experiment. Electrospinning requires further development of technology. The low - energy electron beam bombardment method needs to improve and simplify the process of electrostatic electret.
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Privacy statement: Your privacy is very important to Us. Our company promises not to disclose your personal information to any external company with out your explicit permission.